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Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
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Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production
Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production

Automatic 10-20000nm3/H CDA Clean Dry Air Purifying Device for Biofuel Production

Customization: Available
Application Fields: Chemical, Food, Medical, Pharmaceutical
Condition: New
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Product Description

Basic Specifications
Model NO.
WP10-A
Gas Type
Argon, Carbon Dioxide, Helium, Hydrogen, Nitrogen, Oxygen
Noise Level
Ultra Low
Purification Method
Adsorption
Technology
High-Temperature Catalysis and Room-Temperature Ad
Purpose
Clean Dry Air (CDA)
Flow Rate
10-20000 nm3/H
Particles
0.003um ~ 1PCS/M3
HS Code
8421399090
Origin
China
Product Description

7N-9N Clean Dry Air (CDA) Purification Plant

The High Quality 10-20000Nm3/H Volatile Bases Removal Clean Dry Air Purification Device is designed for Point Of Use applications across various industrial sectors. It consists of process pipelines and an advanced electronic control system. The integrated PLC manages the operation of process valves, ensuring a safe, stable, and continuous supply of ultra-pure gas.

CDA Purifying Device
● Dual-tower alternating adsorption for continuous gas supply
● Online regeneration of adsorbents for long-term use
● 316L SS EP high-grade purification vessel
● PLC control system for fully automated operation
● Safety-enhanced alarm and interlock functions
Technical Layout
Parameter Specifications (WP10-A)
Purifiable GasesCDA (Clean Dry Air)
Purification ProcessAdsorption
H2O Level< 0.1 ppb
Volatile Acids (VA)< 10 ppt
Volatile Bases (VB)< 10 ppt
Refractory Compounds (RC)< 10 ppt
Total Organic Carbon (TOC)< 10 ppt
Particle Control≤1pcs/m3 (>0.003μm)
Standard Flow Rate10-20000 Nm3/h
Internal Structure 1
Internal Structure 2
Detailed Photos
System Detail Photo
Applications
Integrated CircuitsIC Manufacturing
SemiconductorsSemiconductors
Silicon WafersSilicon Wafer Production
Panel DisplayPanel & Display
Optical FiberOptical Fiber Preform
Solar CellsSolar Cell Production
LED ManufacturingLED & Laser Diodes
High Purity GasUHP & Mixed Gas Production
Certifications
Quality Certifications
Frequently Asked Questions
What types of impurities can the WP10-A series remove?
The system is designed to deeply remove H2O, volatile acids (VA), volatile bases (VB), refractory compounds (RC), and total organic carbon (TOC) at room temperature.
Does the system provide a continuous gas supply?
Yes, it utilizes a dual-tower alternating adsorption process which ensures uninterrupted gas supply while one tower is in regeneration mode.
What is the purity level for water (H2O) after purification?
The system achieves ultra-high purity levels with H2O content reduced to less than 0.1 ppb.
How is the operation of the purification plant controlled?
The plant is fully automated via a PLC control system that manages the process valves and includes safety-enhanced alarm interlocks.
What materials are used in the construction of the purification vessel?
To meet the requirements of high-purity gas applications, we use 316L Stainless Steel with Electropolishing (EP) for the purification vessels.
What is the range of gas flow rates supported?
Our standard systems support flow rates ranging from 10 to 20,000 Nm3/h, making them suitable for both small-scale and large-scale industrial use.

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